(1. 湖南科技大學(xué) 材料科學(xué)與工程學(xué)院，湘潭 411201；
2. 湖南科技大學(xué) 高溫耐磨材料及制備技術(shù)湖南省國(guó)防科技重點(diǎn)實(shí)驗(yàn)室，湘潭 411201；
3. 湖南科技大學(xué) 精細(xì)聚合物可控制備及功能應(yīng)用湖南省重點(diǎn)實(shí)驗(yàn)室，湘潭 411201；
4. 湖南科技大學(xué) 新能源儲(chǔ)存與轉(zhuǎn)換先進(jìn)材料湖南省重點(diǎn)實(shí)驗(yàn)室，湘潭 411201)
摘 要: 以碳球?yàn)槟０澹捎萌軇岱ê铣闪薟O3/ZnO復(fù)合半導(dǎo)體材料。采用XRD、SEM、EDS對(duì)材料物相、形貌、成分和微結(jié)構(gòu)進(jìn)行了表征，并研究其對(duì)亞甲基藍(lán)的降解。結(jié)果表明：所制備的WO3/ZnO半導(dǎo)體是由納米顆粒自組裝而成，具有中空結(jié)構(gòu)；相對(duì)于純相的單個(gè)組分ZnO，WO3/ZnO異質(zhì)結(jié)復(fù)合材料的吸收譜峰明顯地向長(zhǎng)波區(qū)紅移，對(duì)亞甲基藍(lán)的最大吸收波長(zhǎng)為664 nm，其禁帶寬度為3.64 eV；在40 min內(nèi)使10 mg/L亞甲基藍(lán)的濃度降低了90%，60 min后完全降解，并具有良好的循環(huán)穩(wěn)定性。WO3/ZnO復(fù)合光催化劑降解過程符合一級(jí)反應(yīng)動(dòng)力學(xué)，其反應(yīng)速率常數(shù)ka=5.58×10-2 h-1。降解機(jī)理研究表明，WO3和ZnO之間滿足能級(jí)匹配條件，能形成n-n型WO3/ZnO異質(zhì)結(jié)，可以有效促使材料的載流子遷移和光生電子-空穴對(duì)的分離，從而提高材料的光催化性能。
關(guān)鍵字: WO3/ZnO；中空球；納米顆粒；復(fù)合半導(dǎo)體；光催化
（1. School of Materials Science and Engineering, Hunan University of Science and Technology, Xiangtan 411201, China;
2. Hunan Provincial Key Defense Laboratory of High Temperature Wear-resisting Materials and Preparation Technology, Hunan University of Science and Technology, Xiangtan 411201, China;
3. Hunan Provincial Key Laboratory of Controllable Preparation and Functional Application of Fine Polymers, Hunan University of Science and Technology, Xiangtan 411201, China;
4. Hunan Provincial Key Laboratory of Advanced Materials for New Energy Storage and Conversion,
Hunan University of Science and Technology, Xiangtan 411201, China）
Abstract:ZnO/WO3 compound semiconductor photocatalysts were prepared with carbon spheres as templates, zinc acetate and sodium tungstate as reaction source. The phase, morphology, composition and microstructure of the products were characterized by XRD, SEM and EDS technique. The results show that n-WO3/n-ZnO composite has red shift of a strong absorption peak at 664 nm on methylene blue (MB) with the band gap of 3.64 eV. The degradation rate of n-WO3/n-ZnO composite on 10 mg/L methylene blue solution reaches 90% in 40 min and the degradation finishes completely after 60 min. The WO3/ZnO composite photocatalyst shows excellent cycle stability. The degradation process confirms to the one-order kinetic model and ka=5.58×10-2 h-1. The research result on the mechanism of degradation of WO3/ZnO composite shows that the energy level matching between WO3 and ZnO can form n-n heterojunction and benefit to enhance photocatalytic performance of WO3/ZnO composite due to improving electron mobility and photo generated electron-hole pairs separation.
Key words: WO3/ZnO; hollow microsphere; nanoparticle; compound-semiconductor; photocatalyst
