(合肥工業(yè)大學(xué)材料科學(xué)與工程學(xué)院，合肥 230009)
摘 要: 采用反應(yīng)磁控濺射法在ITO玻璃上制備氮摻雜氧化鎢(WO3:N)薄膜。采用XRD、XPS、AFM對薄膜的結(jié)構(gòu)、成分、結(jié)合鍵和表面形貌進行表征。將WO3:N薄膜封裝制成電致變色器件，并采用直流穩(wěn)壓電源和分光光度計對其進行變色調(diào)制性能測試。結(jié)果表明：制備的WO3:N薄膜為納米晶結(jié)構(gòu)，其衍射峰位隨著含N量的增加而右移；WO3:N薄膜中W、O分別以W6+和O2-存在，而N以中性價態(tài)、WO3中的O位替換以及表面吸附3種狀態(tài)存在；隨著WO3:N薄膜中含N量的升高，表面粗糙度逐漸增大，且有利于器件著色；當摻氮2.80%(摩爾分數(shù))時，電致變色器件調(diào)制幅度最大為68.8%，比未摻氮器件的高出7.7%，適用于節(jié)能玻璃。
關(guān)鍵字: WO3:N薄膜；反應(yīng)磁控濺射；電致變色器件；節(jié)能
（School of Materials Science and Engineering, Hefei University of Technology, Hefei 230009, China）
Abstract:N doped tungsten oxide(WO3:N) thin films were prepared on ITO coated glass substrate by reactive magnetron sputtering. The structure, composition, chemical bondsand surface morphology of films were characterized by XRD, XPS and AFM, respectively. Furthermore, WO3:N thin films were assembled into electrochromic devices, the modulation properties were investigated by DC regulated power supply and spectrophotometer. The results indicate that WO3:N films are in nanocrystalline structure, whose scattering peaks move right as N content increases. W and O elements exist in W6+ and O2-, respectively, whereas, there are three chemical states for N element, namely, neutral atom, substituting O in W—O bond, and absorption onto film surface during deposition. With N content of WO3:N film increasing, the film surface gets rougher, and this will benefit coloring reaction of the device. The device reaches the highest modulation extent(68.8%, 7.7% higher than that of undoped device) at 2.80%N doping (mole fraction), which is suitable for energy conservation glass.
Key words: WO3:N thin film; reactive magnetron sputtering; electrochromic device; energy conservation
