Transactions of Nonferrous Metals Society of China The Chinese Journal of Nonferrous Metals

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中國有色金屬學報

ZHONGGUO YOUSEJINSHU XUEBAO

第25卷    第5期    總第194期    2015年5月

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文章編號:1004-0609(2015)-05-1285-09
Co2+含量對鍍Ti金剛石-Ni-Co復(fù)合電沉積的影響
張 鸝,王日初,彭超群,張 純,譚時雨,王乃光

(中南大學 材料科學與工程學院,長沙 410083)

摘 要: 采用電鍍法制備鍍Ti金剛石-Ni-Co復(fù)合鍍層,研究鍍液中Co2+含量對鍍層形貌和性能的影響,并通過電化學阻抗譜研究Ni-Co復(fù)合電沉積過程。結(jié)果表明:當鍍液中未添加Co2+時,所制備的鍍Ti金剛石-Ni復(fù)合鍍層內(nèi)凹痕較多;鍍液中添加Co2+后,鍍Ti金剛石-Ni-Co復(fù)合鍍層內(nèi)凹痕消失,晶粒均勻。隨著鍍液中Co2+含量的增加,所制備的鍍Ti金剛石復(fù)合鍍層的顯微硬度先增加后減少。當鍍液中Co2+含量為6%(摩爾分數(shù))時,在-0.85 V電位下Ni-Co共結(jié)晶電化學阻抗譜的電荷轉(zhuǎn)移電阻最大,制備的鍍Ti金剛石-Ni-Co鍍層內(nèi)金剛石含量最高。此外,當鍍液中Co2+含量增加至8%時,鍍Ti金剛石-Ni-Co復(fù)合鍍層內(nèi)金剛石粉體的沉積量最少。

 

關(guān)鍵字: Ni-Co合金;金剛石;鍍鈦;復(fù)合電沉積;交流阻抗

Effects of Co2+ content on Ti-coated diamond-Ni-Co composite electrodeposition
ZHANG Li, WANG Ri-chu, PENG Chao-qun, ZHANG Chun, TAN Shi-yu, WANG Nai-guang

School of Materials Science and Engineering, Central South University, Changsha 410083, China

Abstract:The Ti-coated-diamond-Ni-Co coating was prepared by electroplating process. Moreover, the effect of Co2+ content variation on the morphology and property of the Ti-coated diamond-Ni-Co coating was investigated. Meanwhile, the composite electrodeposition process was studied by electrochemical impedance spectroscopy (EIS). The results show that there are many dents on the Ti-coated diamond-Ni coating when Co2+ is not added in the plating bath. However, the dents disappear and the grain size becomes more uniform when Co2+ is added into the plating bath. Moreover, with the increase of Co2+ content in the plating bath, the microhardness of the composite coatings rises firstly and then declines. As Co2+ content in the plating bath is 6% (mole fraction), the charge transfer resistance of the Ni-Co codeposition evaluated from the EIS at -0.85 V reaches the maximum value, and the content of diamond in the composite coating is the highest. In addition, as Co2+ content in the plating bath increases to 8%, the content of diamond in the composite coatings is the least.

 

Key words: Ni-Co alloy; diamond; Ti plating; composite electrodeposition; alternating current impedance

ISSN 1004-0609
CN 43-1238/TG
CODEN: ZYJXFK

ISSN 1003-6326
CN 43-1239/TG
CODEN: TNMCEW

主管:中國科學技術(shù)協(xié)會 主辦:中國有色金屬學會 承辦:中南大學
湘ICP備09001153號 版權(quán)所有:《中國有色金屬學報》編輯部
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