(1. 華南理工大學(xué) 材料科學(xué)與工程學(xué)院，廣州 510641；
2. 廣州有色金屬研究院 新材料研究所，廣州 510651)
摘 要: 采用陽極型氣體離子源結(jié)合非平衡磁控濺射的方法，在單晶硅及Ti6Al4V鈦合金基體上制備摻鎢類金剛石多層膜(DLC/WC)，利用俄歇電子譜(AES)、透射電鏡(TEM)、X射線光電子能譜(XPS)及X射線衍射(XRD)等對膜層的過渡層、界面及微觀結(jié)構(gòu)進行研究。結(jié)果表明：所制備的膜層厚2.7 μm，硬度高達3 550HV，摩擦因數(shù)為0.139，與Ti6Al4V基體結(jié)合力為52 N；W主要以納米晶WC的形式與非晶DLC形成WC/DLC多層膜，該多層膜仍呈現(xiàn)出類金剛石膜的主要特征。
關(guān)鍵字: 類金剛石/碳化鎢多層膜；微觀結(jié)構(gòu)；離子源；非平衡磁控濺射
（1. School of Materials Science and Engineering, South China University of Technology, Guangzhou 510641, China;
2. Department of New Materials, Guangzhou Research Institute of Non-ferrous Metals, ）
Abstract:Anodic gas ion beam source (IBS) and unbalance magnetron sputtering (UBM) were employed to deposit diamond-like carbon/WC (DLC/WC) multilayer film on Si. Auger electron spectroscopy (AES), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), X-ray diffractometry (XRD) and microhardness tester were employed to evaluate the interface, microstructure and composition of films. The results show that the film thickness is 2.7 μm, hardness up to 3 550HV, the friction coefficient is 0.139, and adhesion strength is 52 N in Ti6Al4V substrate. In the film, nanocrystalline WC and amorphous DLC layer overlap the formation of DLC/WC multilayers. The multilayer film still shows that the main features, which are very similar to the DLC film.
Key words: diamond-like carbon/WC multilayer films; microstructure; ion source; unbalanced magnetron sputtering
