(湖南大學(xué) 材料科學(xué)與工程學(xué)院, 長沙 410082)
摘 要: 采用電子束蒸發(fā)技術(shù)在AlN襯底上蒸鍍Ti/Ni雙層金屬化薄膜，通過SEM、EDS和AES等方法分析拋光AlN表面狀態(tài)及與金屬化薄膜間的相互作用。結(jié)果表明：離子束清洗可去除AlN襯底表面疏松層，改變AlN襯底表面狀態(tài)，提高襯底表面能。結(jié)合熱蒸發(fā)原子的作用，膜基界面處Al、N和Ti元素之間產(chǎn)生相互擴(kuò)散現(xiàn)象，AlN陶瓷和Ti膜的附著機(jī)制由未清洗前的簡單附著改變?yōu)閿U(kuò)散附著，極大提高了金屬化薄膜粘結(jié)性能，其拉脫強(qiáng)度達(dá)300 MPa以上，且無需后續(xù)退火處理。
關(guān)鍵字: 氮化鋁；表面狀態(tài)；金屬化；粘結(jié)性能；離子束
Ti/Ni metallized thin films
（School of Materials Science and Engineering, Hunan University, Changsha 410082, China）
Abstract:Metallized thin films of Ti and Ni on AlN substrate were deposited by E-beam evaporation. AlN ceramic surface state and interaction with metallized thin films were investigated by SEM, EDS and AES. The results indicate that a loosened layer of AlN substrate surface is wiped off by ion beam sputter-cleaning, which can change the state of AlN ceramic surface, and then increase the surface energy. Because of the increasing surface energy and the influence of hot evaporation atoms, the spread among Al, N and Ti exists at the interface, and the adherence mechanism for Ti film and AlN is changed from simple adhesion to spread adhesion during ion beam sputter-cleaning. Thus, the adhesion strength of metallized thin films is improved greatly. So the sample shows a high adhesion strength over 300 MPa and needs no anneal treatment.
Key words: aluminum nitride; surface state; metallization; adhesion strength; ion beams
