(中山大學(xué) 化學(xué)與化學(xué)工程學(xué)院， 廣州 510275)
摘 要: 利用循環(huán)伏安法和恒電位電解法研究了室溫下在二甲基亞砜溶劑(DMSO)中Y-Ni功能合金膜的電沉積制備。 結(jié)果表明， 在YCl3 (0.10 mol·L-1)NiCl2 (0.10 mol·L-1)DMSO溶液中， 控制電位在-1.15～-2.50V范圍內(nèi)進(jìn)行恒電位電解， 可得到有金屬光澤、 附著力強(qiáng)的銀灰色非晶態(tài)Y-Ni合金膜，厚度約為1.4μm。 Y-Ni合金膜中Y的含量在3.5%～80%范圍內(nèi)隨陰極電位的負(fù)移而增加。
關(guān)鍵字: Y-Ni合金膜; 電沉積; 有機(jī)溶劑
（School of Chemistry and Chemical Engineering， Zhongshan University，Guangzhou 510275， P.R.China）
Abstract:The electrodeposition of Y-Ni alloy film from dimethylsulfoxide (DMSO) electrolyte solution was investigated using cyclic voltammetry and potentiostatic technique. The cyclic voltammograms of Pt and Cu electrodes in YCl3 (0.10 mol·L-1)NiCl2 (0.10mol·L-1)DMSO were measured， which indicate that the Y-Ni alloy can be electrodeposited. The Y-Ni film on Cu electrode was obtained by potentiostatic electrolysis at -1.15～-2.50 V (vs SCE). The Y-Ni film is amorphous， Y content is in the range of 3.5%～80% and thickness is about 1.4μm analyzed by EDAX and XRD. The Y content in deposited film increases with the shift of cathode potential to negative direction.
Key words: Y-Ni alloy film; electrodeposition; dimethylsulfoxide
