(1. 湘潭工學院環(huán)境工程與化學新材料研究所, 湘潭 411201;
2. 中南工業(yè)大學冶金物理化學和化學新材料研究所, 長沙 410083)
摘 要: 提供了一種由絡合劑、穩(wěn)定劑、添加劑組成的Cr(Ⅲ)水溶液電鍍鏡面非晶態(tài)鉻新方法。采用Hull槽實驗、動電位掃描(LSV)、計時電流(CA)、計時電位(CE)等電化學方法對Cr(Ⅲ)水溶液中電沉積非晶態(tài)鉻的電化學機理進行了研究。實驗結果表明在-0.96～-1 .1 V之間生成的藍膜是光亮非晶態(tài)Cr層得以電沉積出來的首要條件。討論了Cr2+離子和Cr(Ⅲ)配合離子在電沉積非晶態(tài)鉻鍍層中的作用以及鏡面非晶態(tài)鉻鍍層的形成機理。并用X射線衍射和掃描電子顯微鏡(SEM)等方法對鉻鍍層的結構進行了檢測分析。
關鍵字: 電沉積；非晶態(tài)鉻；電化學
（1. Institute of Environment Engineering and New Chemical Materials,
Xiangtan Polytechnic University, Xiangtan 411201, P.R.China;
2. Institute of Metallurgy Physical Chemistry and New Chemical Materials,
Central South University of Technology, Changsha 410083, P.R.China）
Abstract:A new type of Cr(Ⅲ) aqueous solution containing complexing agent, stabilizer and additives has been proposed for the electrodeposition of a mirror bright amorphous chromium. The mechanism of electrodeposition of amorphous chromium in the bath are studied by means of Hull cell experiment, linear sweep voltammetry (LSV), chronoamperometry (CA) and chronopotentiometry (CE). Experiments show that the electrodeposition of a blue film composed of Cr(OH)3, which were electrodeposited firstly at -0.96～-1.1V in the bath, is a prerequisite for the electrodeposition of the mirror bright amorphous chromium layer. The roles of Cr2+ and Cr(Ⅲ) complexes for electrodeposition of amorphous chromium and the mechanism of electrodeposition we re discussed. X-ray diffraction (XRD) and scanning electron microscope (SEM) were used to characterize the chromium deposits.
Key words: electrodeposition; amorphous chromium; electrochemistry
