(1. 上海電力學(xué)院 電化學(xué)研究室, 國(guó)家電力公司熱力設(shè)備腐蝕與防護(hù)重點(diǎn)實(shí)驗(yàn)室, 上海 200090;
2. 華東理工大學(xué) 防腐蝕中心， 上海 200237;
3. 廈門(mén)大學(xué) 固體表面物理化學(xué)國(guó)家重點(diǎn)實(shí)驗(yàn)室, 廈門(mén) 361005)
摘 要: 用表面增強(qiáng)拉曼光譜技術(shù)(SERS)對(duì)在3%NaCl溶液中苯并三氮唑(BTA)及其衍生物4-羧基苯并三氮唑(4CBTA)對(duì)銅的緩蝕作用機(jī)理進(jìn)行了研究。發(fā)現(xiàn)4CBTA對(duì)銅的緩蝕作用機(jī)理與BTA相似，在較正電位下兩者都是通過(guò)三唑環(huán)與銅形成配合物覆蓋在銅表面；隨著電位負(fù)移，銅電極表面吸附的分子形式的BTA或4CBTA數(shù)量增多； 4CBTA中的COOH基團(tuán)只是起到空間位阻的作用，沒(méi)有參與電極表面的吸附。兩者復(fù)配使用時(shí)以BTA吸附為主，其緩蝕機(jī)理沒(méi)有發(fā)生改變，也沒(méi)有產(chǎn)生協(xié)同效應(yīng)。
關(guān)鍵字: 銅電極； 苯并三氮唑； 緩蝕劑； 表面增強(qiáng)拉曼光譜
copper electrode in 3% NaCl solution
TIAN Zhong-qun３，LIN Chang-jian３
（1. Electrochemical Research Group, Shanghai Institute of Electric Power,
Shanghai 200090, P.R.China;
2. Corrosion Prevention Center, East China University of Science and Technology,
Shanghai 200237, P.R.China;
3. State Key Laboratory for Physical Chemistry of Solid Surface,
Xiamen University, Xiamen 361005, P.R.China）
Abstract:The corrosion inhibition of BTA and its derivative 4CBTA on Cu electrode in 3% NaCl solution was studied by SERS technique. The inhibition mechanism for these inhibitors was found to be nearly the same, which form a protective film through the triazole ring. As the potential turns negative, the molecules of BTA or 4CBTA gradually adsorbs on the copper surface. The substitute group(_COOH) of 4CBTA acts as a steric hindrance. A combination of BTA and 4CBTA doesn't show any synergistic effect and the adsorption substance on the copper surface is mainly BTA.
Key words: Cu electrode； BTA； inhibitor； SERS
