(中國(guó)科學(xué)院 力學(xué)研究所， 北京 100080)
摘 要: 介紹了利用過(guò)濾電弧離子鍍沉積(TiAl)N薄膜初步的研究結(jié)果。在電弧靶材前沿的磁場(chǎng)作用下，有效減小了薄膜的宏觀顆粒尺寸，并極大地降低了顆粒密度。同時(shí)，過(guò)濾電弧的作用，使偏壓對(duì)膜成分的影響減弱，薄膜的硬度隨膜中鋁含量的增加而提高，(TiAl)N的抗氧化能力明顯提高。
關(guān)鍵字: 過(guò)濾電弧； 薄膜； 宏觀顆粒； 抗氧化性能
high quality (TiAl)N hard coatings
（Institute of Mechanics, Chinese Academy of Science,
Beijing 100083, P.R.China）
Abstract:Deposition and properties of (TiAl)N have been investigated by filter arc evaporation. The size and density of macroparticle in (TiAl)N films are considerably decreased under the basement of electron's and ion's movement in the straight filter. The bias voltage appears to be the main parameter controlling the final composition in the conventional arc evaporation process. But under the filter arc evaporation process, the influence of the bias voltage on the final composition of the (TiAl)N are abated. Increasing aluminum content leads to an increase in surface hardness. The oxidation resistance of the (TiAl)N is obviously superior to that of TiN film.
Key words: filter arc evaporation; films deposition; macro-particle; oxidation resistance
