(太原理工大學 化學工程系，太原 030024)
摘 要: 采用脈沖電沉積法在石墨基體上制備了鐵氰化鎳膜(NiHCF膜)。通過循環(huán)伏安法考察了不同脈沖參數(shù)(脈沖電壓、脈沖周期、占空比、沉積次數(shù))條件下制備的石墨基NiHCF膜電極的離子交換容量，并通過SEM和XPS分析了膜的表面形貌與組成。結(jié)果表明：脈沖電壓0.3 V(vs SCE)、脈沖周期0.6 s、占空比為50%時沉積得到的NiHCF膜均勻致密，且具有較大的離子交換容量和良好的穩(wěn)定性。脈沖電沉積法可用于制備性能優(yōu)良的電化學控制離子分離膜電極。
關(guān)鍵字: 脈沖電沉積；NiHCF膜；電化學控制離子分離；循環(huán)伏安
（Department of Chemical Engineering, Taiyuan University of Technology, Taiyuan 030024, China）
Abstract:The electroactive nickel hexacyanoferrate (NiHCF) thin films were generated on graphite substrates by pulsed electrodeposition. The composition and morphology of the NiHCF thin film were investigated using XPS and SEM. In 1 mol/L KNO3 solution, the potential cycling in the range of 200−1 000 mV (vs SCE) is used to reversibly intercalate and deintercalate K+ from the matrix. The effects of the pulsed deposition parameters, such as pulse potential, duty cycle and deposition time (ton/toff) on the ion-exchange capacity of NiHCF film electrodes were investigated. The cycle life of the film electrodes was also investigated. The results show that the NiHCF thin films formed on graphite substrates are suitable for electrochemically controlled ion separation (ECIS) processes. The films display high ion exchange capacity for K+ and good stability, and the optimum pulse potential, pulse period and duty cycle are 0.3 V (vs SCE), 0.6s and 50%, respectively.
Key words: pulsed electrodeposition; NiHCF thin film; electrochemically controlled ion separation; cyclic voltammetry
