(中南大學 冶金科學與工程學院，長沙 410083)
摘 要: 將“活性硫化鎳法”所用的除銅試劑“硫化鎳”視為先導化合物，按電子等排原理，通過分子修飾進行類型衍化，修飾陰離子，以一種新設計的含硫化學結構取代S2−，得到的新型除銅劑為NAS和硫化鎳混合物。結果表明：當NAS純度α≥73%(NAS在混合物中所占比例)、除銅劑用量為理論量的1.2倍、溶液pH值為4.0、反應溫度為60 ℃時反應80 min后，采用新型除銅劑從鎳電解陽極液中除銅，除銅后溶液中的銅濃度c(Cu2+)可降至1.57×10−5 mol/L，除銅渣中銅鎳質量比不小于25，遠優(yōu)于工業(yè)生產(chǎn)的要求(c(Cu2+)≤1.57×10−5 mol/L，渣中銅鎳質量比不小于15)；NAS在自然條件下放置62 d后，其除銅效果仍然能夠滿足生產(chǎn)要求，且NAS在除銅過程中沒有引入有害離子進入溶液。
關鍵字: 鎳電解陽極液；除銅；電子等排原理
（School of Metallurgical Science and Engineering, Central South University, Changsha 410083, China）
Abstract: New highly effective removing copper reagent, NAS, was obtained through lead generation by molecule modification based on the theory of isostere principle. Regarded as a leading compounds, NiS was used as a kind of reagent for removing copper in the technology of active nickel sulfide. NAS was designed by replacing S2− of NiS with a kind of new chemical structure through modifying anion. The results show that removing copper with NAS will achieve the best result when NAS purity α is more than 73%, the dosage of NAS is 1.2 times of theoretical value, and when pH value is 4.0 at 60 ℃. The concentration of copper can reach 1.57×10−5mol/L in the electrolyte solution and the mass ratio of copper to nickel is more than 25 in the residue after removing copper. Especially, after NAS is kept for 62 d, it can still satisfy the demand of removing copper. Moreover, the copper sulfide, with small solubility product constant, is produced after removing copper with NAS. No harmful ions enter into the nickel electrolyte solution.
Key words: nickel electrolyte solution; removing copper; isostere principle
