( 1. 西安交通大學(xué) 金屬材料強(qiáng)度國家重點(diǎn)實(shí)驗(yàn)室， 西安 710049；
2. 慕尼黑工業(yè)大學(xué) 無機(jī)材料化學(xué)研究所， 德國， 慕尼黑 D-85747)
摘 要: 用反應(yīng)磁控濺射方法， 在不銹鋼表面沉積Ti-Si-N薄膜。 用原子力顯微鏡觀察薄膜的表面形貌， Ti-Si-N顆粒尺寸小于0.1μm， 用亞微壓入儀測試薄膜硬度， 當(dāng)硅的摩爾分?jǐn)?shù)為9.6%時(shí)， 薄膜硬度出現(xiàn)最大值47GPa。 球-盤式摩擦磨損結(jié)果表明， Ti-Si-N薄膜的耐磨性能明顯優(yōu)于TiN薄膜， 加入少量硅元素后， TiN薄膜的抗磨損性能有顯著提高， 但Ti-Si-N薄膜的室溫摩擦系數(shù)較高（0.6~0.8）， 高溫下摩擦系數(shù)也僅輕微降低（550℃， 0.5~0.6）。 由于Ti-Si-N薄膜的摩擦系數(shù)可能與磨損中氧化物生成量的增加有關(guān)， 常溫下Ti-Si-N薄膜的摩擦系數(shù)隨硅摩爾分?jǐn)?shù)的增加而增大，而高溫下Ti-Si-N薄膜的摩擦系數(shù)隨硅含量上升而降低。
關(guān)鍵字: Ti-Si-N薄膜；反應(yīng)磁控濺射； 摩擦學(xué)
magnetron sputtering reactive deposition
（ 1. State Key Laboratory for Mechanical Behavior of Materials,Xi′an Jiaotong University, Xi′an 710049, China;
2. Institute for Chemistry of Inorganic Materials,
Technical University Munich, Lichtenbergst.4, D-85747 Garching, Munich, Germany）
Abstract: Multiphase nanocomposite thin films composed of nanocrystalline TiN and nano-sized amorphous Si3N4 were deposited on stainless steel substrate at 550℃ using magnetron sputtering reactive deposition technique. The micro-hardness of Ti-Si-N films can reach 47GPa when molar fraction of silicon is 9.6%. Sliding friction and wear investigations were performed using ball-on-disk typed high-temperature tribometer without lubrication. The wear resistant properties of TiN film increase remarkably with certain addition of silicon, while friction coefficient remains high(about 0.6～0.8) at room temperature and reduces only slightly at elevated temperature(0.5～0.6 at 550℃). The friction coefficient increases with increasing molar fraction of silicon at room temperature, but it will decrease with increasing molar fraction of silicon at elevated temperature, because the friction coefficient may relate to the increasing of oxides formations during wear test.
Key words: Ti-Si-N coating; reactive magnetron sputtering; tribological behavior
