(1. 中南大學(xué) 材料科學(xué)與工程學(xué)院，長(zhǎng)沙410083； 2. 有色金屬材料科學(xué)與工程教育部重點(diǎn)實(shí)驗(yàn)室，長(zhǎng)沙410083)
摘 要: 采用反應(yīng)磁控濺射法在玻璃基底上沉積氧化釩薄膜，分別利用X射線衍射 (XRD)、原子力顯微鏡(AFM)和紅外光譜儀分析樣品的物相、表面形貌和紅外光透過(guò)率。結(jié)果表明：氧氣體積分?jǐn)?shù)低于15%時(shí)，薄膜為低價(jià)釩氧化物，高于20%時(shí)薄膜為V2O5；氧氣體積分?jǐn)?shù)等于15%時(shí)，濺射功率由150 W增加到200 W，薄膜中釩的價(jià)態(tài)變低；當(dāng)濺射功率為250 W時(shí)，薄膜物相變成VO2。隨著沉積時(shí)間從30 min增加到60 min，原子力顯微分析顯示VO2顆粒尺寸從約200 nm增加到400 nm；紅外光透過(guò)率范圍從55%~65%減小到45%~55%。
關(guān)鍵字: 氧化釩；反應(yīng)磁控濺射；紅外透過(guò)率
（1. School of Materials Science and Engineering, Central South University, Changsha 410083, China; 2. Key Laboratory for Nonferrous Materials Science and Engineering of Ministry of Education, Changsha 410083,China）
Abstract:VOx thin films were produced on the substrates of glass by reactive magnetron sputtering. The phases, morphology and infrared transmittance were detected by X-ray diffractometer, atomic force microscopy and infrared spectrometer, respectively. The results show that, under the oxygen volume fraction φ(O2) of less than 15%, the films are vanadium oxides with low-valences. When φ(O2) is more than 20%, the films are V2O5. With φ(O2) of 15%, the average valence of vanadium becomes lower after the sputtering power increasing from 150 W to 200 W, and the films change to VO2 with the sputtering power of 250 W. While the sputtering time increases from 30min to 60min, the infrared transmittance of the VO2 films decreases from 55%−65% to 45%−55% and the size of grains increases from about 200 nm to 400 nm.
Key words: vanadium dioxides; reactive magnetron sputtering; infrared transmittance
