(1. 重慶大學(xué) 機(jī)械工程學(xué)院，重慶 400044；2. 重慶大學(xué) 數(shù)理學(xué)院，重慶 400044；3. 重慶大學(xué) 材料科學(xué)與工程學(xué)院，重慶400044；4. Teer Coatings Ltd, West Stone House, Berry Hill Industrial Estate,Droitwich, Worcestershire, WR9, 9AS, United Kingdom)
摘 要: 研究在不同工藝條件下用直流反應(yīng)磁控濺射技術(shù)在T10襯底上制備Cr-N涂層，并采用光電子能譜儀和XRD依次分析Cr-N涂層的表面結(jié)構(gòu)和工藝參數(shù)對(duì)Cr-N涂層成分及相組成的影響。結(jié)果表明，Cr-N涂層在存放一段時(shí)間后表面產(chǎn)生復(fù)雜的Cr2O3相以及Cr(O，N)x相；常溫下隨著N2含量的增加，涂層相結(jié)構(gòu)逐漸由Cr轉(zhuǎn)變?yōu)榛瘜W(xué)比的CrN相。當(dāng)N2含量為33.3％時(shí)，Cr-N涂層的相成分主要為Cr2N+CrN。并發(fā)現(xiàn)襯底偏壓直接影響Cr-N系涂層的晶態(tài)及取向特征，當(dāng)偏壓增加到−130 V時(shí)，Cr-N涂層中β-Cr2N相結(jié)構(gòu)逐漸轉(zhuǎn)變?yōu)?/SPAN>(110)和(300)取向結(jié)構(gòu)。
關(guān)鍵字: 鉻氮涂層；磁控濺射；T10；Cr2N；CrN
（1. College of Mechanical Engineering, Chongqing University, Chongqing 400044, China;2. College of Mathematics and Physics, Chongqing University, Chongqing 400044, China;3. College of Materials Science and Engineering, Chongqing University, Chongqing 400044, China;4. Teer Coatings Ltd, West Stone House, Berry Hill Industrial Estate, Droitwich, Worcestershire,WR9, 9AS, United Kingdom）
Abstract:A series of chromium-nitride coatings deposited on T10 substrates were prepared by direct current reactive magnetron sputtering with variable processing conditions, the phase and composition variation with different depositing processes were analyzed by X-ray diffraction, and surface structure of Cr-N coatings was analyzed by X-ray photoelectron spectroscopy. The results indicate that complicated Cr2O3 and Cr(O, N)x occur on surface of Cr-N coatings after these samples are deposited, under normal temperature conditions the phase changes from Cr to stoichiometry CrN with reactive gas N2 increasing. Phase composition of chromium-nitride coatings is mainly β-Cr2N+CrN when N2 content is 33.3％. Substrate bias voltage has significant effect on the phase state and the lattice orientation of the coating. As the bias voltage increases to −130 V, the diffraction summit of β-Cr2N phase gradually transfers into preferential orientations of (110) and (300).
Key words: chromium-nitride coatings; magnetron sputtering; T10; Cr2N; CrN
