(1. 中南大學(xué) 材料科學(xué)與工程學(xué)院，長(zhǎng)沙410083；
2. 廣州有色金屬研究院 材料表面工程研究所，廣州 510651)
摘 要: 采用中頻磁控濺射結(jié)合無(wú)燈絲離子源技術(shù)沉積梯度Cr/CrN/CrNC/CrC膜層，設(shè)計(jì)兩組正交實(shí)驗(yàn)對(duì)膜層中界面Cr層及梯度層沉積的工藝參數(shù)對(duì)附著性能的影響進(jìn)行研究。利用掃描電鏡(SEM)、電子能譜(EDS)對(duì)其表面形貌及梯度成分進(jìn)行表征；用劃痕儀、顯微硬度計(jì)及洛氏硬度計(jì)測(cè)評(píng)其附著性能，并對(duì)比兩者測(cè)評(píng)的有效性。所得最優(yōu)工藝參數(shù)為：梯度層沉積偏壓100 V，中頻功率6.5 kW，真空度0.6 Pa；Cr層的沉積時(shí)間、離子源電流及中頻功率分別為2 min、4 A和6.5 kW。高中頻功率及離子輔助沉積Cr層能有效提高膜層附著力。
關(guān)鍵字: CrC；中頻磁控濺射；離子源；附著力
（1. School of Materials Science and Engineering, Central South University, Changsha 410083, China;
2. Guangzhou Research Institute of Nonferrous Metals,Guangzhou 510651, China）
Abstract:The Cr/CrN/CrNC/CrC graded interlayer was deposited by MF-magnetron sputtering combined with ion source technique. Two orthogonal experiments were designed to study the relationship between adhesion and processing parameters both for Cr-interface and interlayer. Surface morphology and composition of graded interlayer were characterized by SEM and EDS. The results show that, the optimum deposition parameters for interlayer are −100 V bias voltages, 6.5 kW MF power under pressure of 0.5 Pa; the optimum deposition parameters for Cr layer are deposition time of 2 min, ion resource current of 6 A and MF power of 6.5 kW. The deposition of Cr layer with high MF power and assistance of ion beam can improve the adhesion.
Key words: CrC; mid-frequency magnetron sputtering; ion source; adhesion
